|  | Landis, Stefan
Nano-lithography
ISTE
 1. Auflage Januar 2011
119,- Euro
2011. 320 Seiten, Hardcover
ISBN 978-1-84821-211-4 - John Wiley & Sons
Preis inkl. Mehrwertsteuer zzgl. Versandkosten.
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| Kurzbeschreibung
Lithography is a complex tool based on the concept of imprinting an original template version onto mass output originally using relatively simple optical exposure, masking, and etching techniques, and now includes exposure to X-rays, high energy UV light, and electron beams in processes developed to manufacture everyday products. This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography.
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