|  | Kääriäinen, Tommi / Cameron, David / Kääriäinen, Marja-Leena / Sherman, Arthur
Atomic Layer Deposition
Principles, Characteristics, and Nanotechnology Applicatons
 2. Auflage Juni 2013
ca. 169,- Euro
2013. 272 Seiten, Hardcover
ISBN 978-1-118-06277-7 - John Wiley & Sons
Preis inkl. Mehrwertsteuer zzgl. Versandkosten.
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| Kurzbeschreibung
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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