Available only as a bound supplement to "Advanced Materials".

WILEY-VCH
2003. Volume 8.
6 issues per year.
Print ISSN 0948-1907
Online ISSN 1521-3862
Language of
publication: English

Editors: M. Hitchman, E. Levy

Description

Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information and book reviews.

All papers are peer-reviewed in the usual Advanced Materials quality.

Chemists, physicists and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films and ceramic processing now have a unified forum for their work.

Readers

Materials scientists, chemists, physicists