|  | Anders, André (ed.)
Handbook of Plasma Immersion Ion Implantation and Deposition
 1. Edition - October 2000
229.- Euro
2000. XXIV, 736 Pages, Hardcover
- Monograph -
ISBN-10: 0-471-24698-0
ISBN-13: 978-0-471-24698-5 - Wiley-VCH, Berlin
Short description
This is the first book to describe a family of plasma techniques used to modify the surface and near-surface layer of solid materials.
From the contents
Introduction (J. Conrad).
FUNDAMENTALS.
Fundamentals of Plasmas and Sheaths (M. Lieberman).
Ion Implantation and Thin-Film Deposition (M. Nastasi, et al.).
Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.).
Materials Characterization and Testing Methods-A Brief Survey (K. Walter, et al.).
TECHNOLOGY.
Design of a PIII&D Processing Chamber (J. Matossian, et al.).
Plasma Sources (A. Anders, et al.).
Pulser Technology (D. Goebel, et al.).
Health and Safety Issues Related to PIII&D (D. Beals, et al.).
APPLICATIONS.
Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.).
Semiconductor Applications (P. Chu, et al.).
Appendices.
Index.
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