2. Edition - March 2009
55.90 Euro
2009. 686 Pages, Softcover
- Professional Book -
ISBN-10: 0-470-01764-3
ISBN-13: 978-0-470-01764-7 - John Wiley & Sons








Short description
Completely updated by internationally recognized contributors with four new chapters and extensive revisions, Surface Analysis: The Principal Techniques now addresses developments in nanotechnology and biotechnology with Q&As, a user-friendly layout, and key facts. The second edition introduces the theory and practice of techniques in research and applied surface analysis, provides practical examples, and demonstrates how to overcome challenges in surface analysis. Students in specialty undergraduate courses, postgraduate students, and analytical scientists will appreciate this comprehensive guide to the surface analysis of substrates.

From the contents
List of Contributors.

Preface.

1 Introduction (John C. Vickerman).

1.1 How do we Define the Surface?

1.2 How Many Atoms in a Surface?

1.3 Information Required.

1.4 Surface Sensitivity.

1.5 Radiation Effects - Surface Damage.

1.6 Complexity of the Data.

2 Auger Electron Spectroscopy (Hans Jörg Mathieu).

2.1 Introduction.

2.2 Principle of the Auger Process.

2.3 Instrumentation.

2.4 Quantitative Analysis.

2.5 Depth Profile Analysis.

2.6 Summary.

References.

Problems.

3 Electron Spectroscopy for Chemical Analysis (Buddy D. Ratner and David G. Castner).

3.1 Overview.

3.2 X-ray Interaction with Matter, the Photoelectron Effect and Photoemission from Solids.

3.3 Binding Energy and the Chemical Shift.

3.4 Inelastic Mean Free Path and Sampling Depth.

3.5 Quantification.

3.6 Spectral Features.

3.7 Instrumentation.

3.8 Spectral Quality.

3.9 Depth Profiling.

3.10 X-Y Mapping and Imaging.

3.11 Chemical Derivatization.

3.12 Valence Band.

3.13 Perspectives.

3.14 Conclusions.

Acknowledgements.

References.

Problems.

4 Molecular Surface Mass Spectrometry by SIMS (John C. Vickerman).

4.1 Introduction.

4.2 Basic Concepts.

4.3 Experimental Requirements.

4.4 Secondary Ion Formation.

4.5 Modes of Analysis.

4.6 Ionization of the Sputtered Neutrals.

4.7 Ambient Methods of Desorption Mass Spectrometry.

References.

Problems.

5 Dynamic SIMS (David McPhail and Mark Dowsett).

5.1 Fundamentals and Attributes.

5.2 Areas and Methods of Application.

5.3 Quantification of Data.

5.4 Novel Approaches.

5.5 Instrumentation.

5.6 Conclusions.

References.

Problems.

6 Low-Energy Ion Scattering and Rutherford Backscattering (Edmund Taglauer).

6.1 Introduction.

6.2 Physical Basis.

6.3 Rutherford Backscattering.

6.4 Low-Energy Ion Scattering.

Acknowledgement.

References.

Problems.

Key Facts.

7 Vibrational Spectroscopy from Surfaces (Martyn E. Pemble and Peter Gardner).

7.1 Introduction.

7.2 Infrared Spectroscopy from Surfaces.

7.3 Electron Energy Loss Spectroscopy (EELS).

7.4 The Group Theory of Surface Vibrations.

7.5 Laser Raman Spectroscopy from Surfaces.

7.6 Inelastic Neutron Scattering (INS).

7.7 Sum-Frequency Generation Methods.

References.

Problems.

8 Surface Structure Determination by Interference Techniques (Christopher A. Lucas).

8.1 Introduction.

8.2 Electron Diffraction Techniques.

8.3 X-ray Techniques.

8.4 Photoelectron Diffraction.

References.

9 Scanning Probe Microscopy (Graham J. Leggett).

9.1 Introduction.

9.2 Scanning Tunnelling Microscopy.

9.3 Atomic Force Microscopy.

9.4 Scanning Near-Field Optical Microscopy.

9.5 Other Scanning Probe Microscopy Techniques.

9.6 Lithography Using Probe Microscopy Methods.

9.7 Conclusions.

References.

Problems.

10 The Application of Multivariate Data Analysis Techniques in

Surface Analysis (Joanna L.S. Lee and Ian S. Gilmore).

10.1 Introduction.

10.2 Basic Concepts.

10.3 Factor Analysis for Identification.

10.4 Regression Methods for Quantification.

10.5 Methods for Classification.

10.6 Summary and Conclusion.

Acknowledgements.

References.

Problems.

Appendix 1 Vacuum Technology for Applied Surface Science (Rod Wilson).

A1.1 Introduction: Gases and Vapours.

A1.2 The Pressure Regions of Vacuum Technology and their Characteristics.

A1.3 Production of a Vacuum.

A1.4 Measurement of Low Pressures.

Acknowledgement.

References.

Appendix 2 Units, Fundamental Physical Constants and Conversions.

A2.1 Base Units of the SI.

A2.2 Fundamental Physical Constants.

A2.3 Other Units and Conversions to SI.

References.

Index.