in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. Deposition of a chromium film, followed by lift-off, converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography. (G. M. Whitesides et al., September 3, Adv. Mater. 2002, 14, 1213-1216)