Future Trends in Microelectronics
The Nano Millennium
Wiley - IEEE (Band Nr. 1)
1. Auflage September 2002
408 Seiten, Hardcover
Wiley & Sons Ltd
A lively and thought-provoking look at the future of
microelectronics
Nanotechnology has been named by the U.S. government as one of the
most important areas of impending technology. It is a common view
among leading professionals in microelectronics that current
explosive developments in the field will likely lead to profound
paradigm shifts in the near future. Identifying plausible scenarios
for the forthcoming evolution of microelectronics presents a
tremendous opportunity for constructive action today, especially
since our economy and, indeed, our civilization seem destined to be
irrevocably shaped by this technology.
Based on ideas and discussions arising from the third meeting in
the Future Trends in Microelectronics (FTM) workshop series, held
in the summer of 2001, this timely and intriguing contributed
volume provides a unique forum for today's leading experts in the
semiconductor microelectronics field to discuss the future
evolution of their profession. Demonstrating a diversity of
opinions, leading professionals in industry, academia, and
government address such provocative questions as:
* With CMOS scaling coming to an end, what kind of research does
the silicon industry need to continue its expansion?
* What is the future beyond shrinking silicon devices?
* Is there practicality in the fashionable topics like quantum
computing, molecular computing, spintronics, and similar research
trends?
* What is the most likely future of microelectronics in the near
and long term?
In this compilation of original research, contributors from
academia, government, and industry provide assessments of important
new ideas and approaches. The result is a lively, intelligent
presentation of diverse points of view that should be required
reading for professionals and students in both the microelectronic
industry and academia.
PART I: THE FUTURE WITH SILICON.
Microelectronics Technology: Challenges in the 21st Century (S.
Sze).
Trends in Microlithography (J. Benschop).
Strategies at the End of CMOS Scaling (P. Solomon).
Driving Technology to Re-Engineer Telecommunications (T. Smith, et
al.).
Rare Earth Metal Oxides as High-k Gate Insulators for Future
MOSFETs (H. Iwai, et al.).
Ultra-Thin Single- and Double-Gate MOSFETs for Future ULSI
Applications: Measurements, Simulations, and Open Issues (D.
Esseni, et al.).
Future Silicon-on-Insulator MOSFETs: Chopped or Genetically
Modified? (F. Allibert, et al.).
Current Transport Models for Engineering Applications (T. Grasser
& S. Selberherr).
Advanced Physically Based Device Modeling for Gate Current and
Hot-Carrier Phenomena in Scaled MOSFETs (P. Palestri, et
al.).
PART II: THE FUTURE BEYOND SILICON: SEMICONDUCTORS,
SUPERCONDUCTORS, PHASE TRANSITIONS, DNA.
FLUX-1: Designing the First Generation of 20-GHz Superconductor
RSFQ Microprocessors in 1.75-mum Technology (M. Dorojevets).
Silicon...Beyond Silicon: Beginning of the End or End of the
Beginning? (I. Lagnado & P. de la Houssaye).
Taming Tunneling (M. Kelly).
Switching Device Based on a First-Order Metal-Insulator Transition
Induced by an External Electric Field (F. Chudnovskiy & S.
Luryi).
DNA Conduction Mechanisms and Engineering (R. Zia, et al.).
New Cold Cathode Paradigms for Vacuum Microelectronics Applications
(M. Cahay, et al.).
PART III: THE FUTURE ALONGSIDE SILICON: OPTICAL.
The Evolution of Optical Data Storage (H. van Houten).
Long Wavelength Quantum Dot Lasers: From Promising to Unbeatable
(N. Ledentsov).
Temperature-Insensitive Semiconductor Lasers (L. Asryan & S.
Luryi).
Trends in Semiconductor Laser Design: Balance Between Leakage, Gain
and Loss in InGaAsP/InP Multiquantum Well Structures (G. Belenky,
et al.).
Terahertz Emitters Based on Intersubband Transitions (Q. Hu, et
al.).
The Future of Photovoltaics (M. Green).
Infrared Detectors Based on InAs/GaSb Superlattices (M. Razeghi, et
al.).
Solid State Lighting (A. Zukauskas, et al.).
Reduction of Reflection Losses in Nonlinear Optical Crystals by
Motheye Patterning (A. Zaslavsky, et al.).
Growth of III-Nitrides on Si(111) and GaN Templates: Challenges and
Prospects (M. Sanchez-Garcia, et al.).
PART IV: THE FUTURE WAY BEYOND SILICON: OTHER PARADIGMS.
Quantum Computing: A View from the Enemy Camp (M. Dyakonov).
Entanglement and Quantum Gate Operations with Spin-Qubits in
Quantum Dots (J. Schliemann & D. Loss).
Quantum Computation with Quasiparticles of the Fractional Quantum
Hall Effect (D. Averin & V. Goldman).
Photonics with Chips (A. Nurmikko).
Metacrystals: Three Dimensional Systems of Interacting Quantum Dots
(D. Johnstone).
InGaAs/GaAs Quantum Well Microcavities with Spatially Controlled
Carrier Injection (S. Mestanza, et al.).
List of Contributors.
Index.
knowledgeable specialists in their fields. It will spur you to
think and will help you realize how and why the technologies you
are using may differ greatly in five or 10 years."
(EDN.com)
"...lively and thought-provoking book..." (Choice, Vol.
40, No. 6 February 2003)
Electrical and Computer Engineering at State University of New York
at Stony Brook.
JIMMY XU is Professor of Engineering and Professor of Physics at
Brown University in Providence, Rhode Island.
ALEX ZASLAVSKY is Associate Professor of Engineering and Physics
at Brown University in Providence, Rhode Island.
