Advances in Photochemistry, Volume 22

Neckers, Douglas C. / Volman, David H. / von Bünau, Günther (Herausgeber)

Advances in Photochemistry (Band Nr. 22)

1. Auflage April 1997
288 Seiten, Hardcover
Wiley & Sons Ltd

ISBN: 978-0-471-16999-4

John Wiley & Sons

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Seit 20 Jahren erforscht diese Reihe bereits die Grenzen und Möglichkeiten der Photochemie. Die Beiträge der Experten bewerten kritisch die vorhandenen Erkenntnisse und Informationen und geben gleichzeitig auch einen Überblick über die Literatur zu diesem Fachgebiet.

Eine grundlegende Einführung in die organische Photochemie auf der Basis von Formeln, Reaktionsschemata, Diagrammen, Definitionen, Graphen und Tabellen. Die leicht verständliche Darstellungsweise ermöglicht es dem Leser, den unmittelbar verständlichen Zahlen ohne weitere Hilfsmittel folgen zu können. Nur wenn zusätzliche Erläuterung der Zahlen erforderlich ist, wird diese durch ergänzenden Text gegeben.

Aus dem Inhalt:
Ultraviolet Photodissocation Studies of Organosulfur Molecules and Radicals: Energetics, Structure Identification, and Internal State Distribution (C. Ng); Photoreactive Organic Thin Films in the Light of Bound Electromagnetic Waves (Z. Sekkat and W. Knoll); Elementary Photoprocesses in Designed Chromophore Sequences on cc-Helical Polypeptides (M. Sisido); The Photochemistry of Indoles (A. Weedon)

Douglas C. Neckers is a McMaster Distinguished Research Professor and Executive Director of the Bowling Green State University Center for Photochemical Sciences. He received his PhD from the University of Kansas in 1963, and is the recipient of various awards and honors, including the 1999 InterAmerican Photochemical Society Award for Outstanding Research. His work includes researching and developing new photopolymerization systems and understanding the molecular details of how polymerization occurs after the absorption of light. He has served as Series Editor of Advances in Photochemistry since the publication of Volume 17 in 1992.

David H. Volman, professor emeritus, chemistry, was born in 1916 in Los Angeles California. He received his BS and MS degrees in chemistry from UCLA in 1937 and 1938 and his Ph.D. from Stanford University in 1940. In 1940 he joined UC Davis as an instructor and junior chemist but left during World War II to work as research chemist for the U.S. Office of Scientific Research and Development - US-OSRD . In 1946 Volman returned with his new wife, Ruth Jackson, who he had met at Northwestern University during the war to UC Davis as an assistant professor in the Department of Chemistry. He became a full professor in 1956. His academic honors included a Guggenheim Foundation Fellowship, a research fellowship at Harvard University, and a visiting research professorship at the University of Washington. He was a founding member of Sigma Xi chapters at Stanford University in 1939 and UC Davis in 1947. He retained his membership for life.

Günther von Bünau is the editor of Advances in Photochemistry, Volume 22, published by Wiley.

D. C. Neckers, Bowling Green State University, Ohio; D. H. Volman, University of California, Davis; G. von Bünau, University Siegen, Germany