Glow Discharge Processes
Sputtering and Plasma Etching
1. Auflage November 1980
432 Seiten, Hardcover
Wiley & Sons Ltd
ISBN:
978-0-471-07828-9
John Wiley & Sons
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Gases.
Gas Phase Collision Processes.
Plasmas.
DC Glow Discharges.
RF Discharges.
Sputtering.
Plasma Etching.
Appendices.
Index.
Gas Phase Collision Processes.
Plasmas.
DC Glow Discharges.
RF Discharges.
Sputtering.
Plasma Etching.
Appendices.
Index.
Brian Chapman is the author of Glow Discharge Processes: Sputtering and Plasma Etching, published by Wiley.
