Wiley-VCH, Berlin Optical Imaging and Metrology Cover A comprehensive review of the state of the art and advances, future potential, and development trend.. Product #: 978-3-527-41064-4 Regular price: $135.51 $135.51 Auf Lager

Optical Imaging and Metrology

Advanced Technologies

Osten, Wolfgang / Reingand, Nadya (Herausgeber)


1. Auflage August 2012
XX, 482 Seiten, Hardcover
577 Abbildungen (56 Farbabbildungen)
21 Tabellen

ISBN: 978-3-527-41064-4
Wiley-VCH, Berlin


A comprehensive review of the state of the art and advances, future potential, and development trends of optical imaging and optical metrology.

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A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.

1. LCOS Spatial Light Modulators: Trends and Applications
2. Three-dimensional Display and Imaging: Status and Prospects
3. Holographic Television: Status and Future
4. Display Holography: Status and Future
5. Incoherent Computer-generated Holography for 3-D Color Imaging and Display
6. Approaches to overcome the Resolution Problem in Incoherent Digital Holography
7. Managing Digital Holograms and the Numerical Reconstruction Process for Focus Flexibility
8. Three-dimensional Particle Control by Holographic Optical Tweezers
9. The Role of Intellectual Property Protection in Creating Business in Optical Metrology
10. On the Difference between 3D Imaging and 3D Metrology for Computed Tomography
11. Coherence Holography: Principles and Applications
12. Quantitative Optical Microscopy at the Nanoscale: New Developments and Comparisons
13. Model-based Optical Metrology
14. Combination of Direct and Indirect Solution Strategies
15. Different Approaches to Overcome Existing Limits in Optical Micro and Nano Metrology
16. Interferometry in Harsh Environments
17. Advanced Methods for Optical Non-destructive Testing
18. Upgrade Holographic Interferometry for Industrial Application by Digital Holography
Prof. Dr. Wolfgang Osten received the BSc from the University of Jena, Germany, in 1979. From 1979 to 1984 he was a member of the Institute of Mechanics in Berlin, working in the field of experimental stress analysis and optical metrology. In 1983 he received the PhD degree from the Martin-Luther-University Halle-Wittenberg for his thesis in the field of holographic interferometry. From 1984 to 1991 he was employed at the Central Institute of Cybernetics and Information Processes in Berlin making investigations in digital image processing and computer vision and heading the Institute for Digital Image Processing from 1988 to 1991. In 1991 he joined the Bremen Institute of Applied Beam Technology (BIAS) to establish and to direct the Department of Optical 3D-Metrology till 2002. Since September 2002 he has been a full professor at the University of Stuttgart and director of the Institute for Applied Optics. Between 2006 and 2010 he was the vice rector for research and technology of the Stuttgart University. His research work is focused on new concepts for industrial inspection and metrology by combining modern principles of optical metrology, sensor technology and image processing. Special attention is paid to the development of resolution enhanced technologies for the investigation of micro and nano structures.

N. Reingand, CeLight Inc., Silver Spring, USA