CVD of Compound Semiconductors
Precursor Synthesis, Development and Applications
1. Edition April 1997
XIV, 338 Pages, Hardcover
179 Pictures
68 tables
Handbook/Reference Book
Short Description
Chemical growth methods of electronic materials are the keystone of microelectronic device processing. This book details the deposition methods available for different materials and makes the chemistry of deposition accessible to the materials scientist.
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Further versions
Chemical growth methods of electronic materials are the keystone of microelectronic device processing. This book discusses the applications of metalorganic chemistry for the vapor phase deposition of compound semiconductors. Vapor phase methods used for semiconductor deposition and the materials properties that make the organometallic precursors useful in the electronics industry are discussed for a variety of materials.
Topics included:
* techniques for compound semiconductor growth
* metalorganic precursors for III-V MOVPE
* metalorganic precursors for II-VI MOVPE
* single-source precursors
* chemical beam epitaxy
* atomic layer epitaxy
Several useful appendixes and a critically selected, up-to-date list of references round off this practical handbook for materials scientists, solid-state and organometallic chemists, and engineers.
Introduction to Vapor-Phase Epitaxy
MOCVD
ALE
CBE
Precursor Chemistry
General Classes
Synthesis/Purification
Effects of Trace Impurities on Layer Properties
Deposition of III-V Semiconductors
MOCVD
ALE
CBE
Deposition of II-VI Semiconductors
MOCVD
ALE
Future Prospects
