Dusty Plasmas
Physics, Chemistry and Technological Impacts in Plasma Processing
1. Edition July 1999
X, 408 Pages, Hardcover
Wiley & Sons Ltd
Short Description
Recent years have seen a spur of interest in dusty plasmas and their numerous materials processing applications, not the least of which are thin film growth, etching, and plasma surface treatments used in the microelectronics industry. This book explains the scientific principles necessary to understand plasma, its behavior and properties, plus practical, industry-based information on how to control the formation and trapping of dust particles in plasma for a wide range of materials processing applications.
Dusty Plasmas Physics, Chemistry and Technological Impacts in Plasma Processing Edited by André Bouchoule Université d'Orléans, France Dusty Plasmas gives the reader a thorough overview of current knowledge on many aspects of the subject, from the basic science to technological implications. The basic physics and chemistry of dusty plasmas developed in the first two chapters are complemented by the more practical considerations of diagnostics and technological implications in the two final chapters. The book will be of interest to those already involved in or just discovering dusty plasmas in their research and/or industrial activity.
* Physics and Modelling of Dusty Plasmas
* Sources and Growth of Particles
* Diagnostics of a Dusty Plasma
* Technological Impacts of Dusty Plasmas
Sources and Growth of Particles (J. Perrin).
Diagnostics of a Dusty Plasma (L. Boufendi, et al. ).
Technological Impacts of Dusty Plasmas (A. Bouchoule.
Indexes.
