Fundamentals of Semiconductor Fabrication

1. Edition August 2007
320 Pages, Softcover
Wiley & Sons Ltd
Short Description
From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence.
Fundamentals of Semiconductor Fabrication provides an introduction to semiconductor fabrication technology, from crystal growth to integrated devices and circuits. It includes theoretical and practical aspects of all major fabrication steps, making it a useful reference tool when students enter the semiconductor industry. Each chapter begins with an introduction and a list of learning goals, and each chapter ends with a summary of important concepts and suggested homework problems.
* Crystal Growth
* Silicon Oxidation
* Photolithography
* Etching
* Diffusion
* Ion Implantation
* Film Deposition
* Process Integration
* IC Manufacturing
* Future Trends and Challenges
Appendix A: List of Symbols
Appendix B: International System of Units
Appendix C: Unit Prefixes
Appendix D: Greek Alphabet
Appendix E: Physical Constants
Appendix F: Properties of Si and GaAs at 300K
Appendix G: Properties of the Error Function
Appendix H: Basic Kinetic Theory of Gas
Appendix I: SUPREM Commands
Appendix J: Percentage Points of the t Distribution
Appendix K: Percentage Points of the F Distribution
Simon M. Sze, Ph.D. is UMC Chair Professor of National Chiao Tung University, and President of the National Nano Device Laboratories. He has received the IEEE Ebers Award, the Sun Yet-sen Award, the National Science and Technology Award, and the National Chair Professor Award. He is a Life Fellow of IEEE, a member of the Academia Sinica, the Chinese Academy of Engineering, and the US National Academy of Engineering. He has authored or coauthored over 150 technical papers, and has written, edited, and contributed to 24 books. His book Physics of Semiconductor Devices (Wiley 1969, 2nd Ed, 1981) is the most cited work in contemporary engineering and applied science publications (over 12,000 citations from ISI Press).